Laser Annealing Systems

The best suitable system to the mass production of low temperature poly-silicon TFT's.
This ELA series that pursued modulization with the laser and optic system made by own company.
The line-up of the system is up to 730x920 mm size substrate as a standard.
The ELA-TW series is the mass production system of the high throughput correspondence that installed the total systems including 2 sets of the

Feature

ELA Series Specifications

Items/Series	ELA7600	ELA9700	ELA1211	ELA1312
Substrate Size	600x750mm	730x920mm	1100x1250mm	1200x1300mm
Beam Size	200mm,300mm,320mm,365mm
Laser Output	200W,240W,300W
Pulse Energy	666mJ,800mJ,1000mJ
Repetition Rate	300Hz
Process Atmosphere	N2/air
Process Temperature	R.T.
Energy Density	Max. 450mJ/cm2
Beam Length	100~200mm	200~300mm	240~320mm	365mm
Beam Width	0.55~1.5mm	0.35~0.6mm	0.35~0.6mm	0.35~0.6mm